Equipment performance
Adjustable transmission speed:0.5-3m/minNormal operating speed:2.5m/mincapacity: Up to 4000 Wafers/H@20mm Up to 6800 Wafers/H@20mm Up to 8000 Wafers/H@20mmEffective utilization rate of equipment:≥98%Etching depth range:3.5~4.5μmFragment rate:≤0.03%Silicon wafer specification
Silicon wafer thickness: ≥ 140 μ mSilicon wafer size: 156.75 * 156.75mm-212 * 212mmEquipment size
Length * width * height: determine the size according to the model selectiontransmission
Transmission type: 5 lane / 6 LaneShaft spacing: 60mmMain drive shaft: 17mm, hexagonDrive roller: Φ 32mmdirection
Working direction:Left→Right / Right→Left(TBD)power supply
Power supply: AC380V 3Ph + PE + n 50Hz (TBD)Control power supply: DC 24VFull load power supply: 75ARecommended maximum fuse size: 100AInstallation requirements
Minimum ground bearing capacity: 75kg / ㎡Minimum workshop height: 3.5mClean room level: iso7 (10K class)Ambient temperature: 17 ℃< RT < 30 ℃Maximum humidity: 70%